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This digital document is an article from High Tech Ceramics News, published by Business Communications Company, Inc. on December 1, 2000. The length of the article is 343 words. The page length shown above is based on a typical 300-word page. The article is delivered in HTML format and is available in your Amazon.com Digital Locker immediately after purchase. You can view it with any web browser.Citation Details
Title: METROLOGY AND ANALYSIS Nanometer-Scale Lithography Devised.
Publication: High Tech Ceramics News (Newsletter)
Date: December 1, 2000
Publisher: Business Communications Company, Inc.
Volume: 12 Issue: 9 Page: NADistributed by Thompson Gale
Excerpt. © Reprinted by permission. All rights reserved.
Lawrence Berkeley Lab has devised a novel nanolithographic technique for generating patterned structures at the atomic level, directly on a substrate. This new technique uses a current-sensing atomic force microscope (AFM) probe both as a preparatory and analytical tool. The mechanism of Berkeley's Lab's direct patterning lithography is electrochemical, setting it apart from the scanning prove-based surface oxidation of metals and semiconductors. Using this procedure, Robert Kostecki and Frank McLarnon have modified the electronic conductance of a thin film of LiMn2O4. Depending on the voltage bias between the AFM tip and the sample, they can "write" with a negatively charged AFM tip and then "read" the produced conductance pattern with a positively charged tip. Thus, with the...
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