Book Description
This digital document is an article from Electronic Materials Update, published by Business Communications Company, Inc. on June 1, 2003. The length of the article is 387 words. The page length shown above is based on a typical 300-word page. The article is delivered in HTML format and is available in your Amazon.com Digital Locker immediately after purchase. You can view it with any web browser.Citation Details
Title: Motorola Researchers Get Lithography Tool.
Publication: Electronic Materials Update (Newsletter)
Date: June 1, 2003
Publisher: Business Communications Company, Inc.
Volume: 17 Issue: 5Distributed by Thompson Gale
Excerpt. © Reprinted by permission. All rights reserved.
Motorola will take delivery of an advanced lithography tool, the Imprio 100, from Molecular Imprints. The tool is based on Step and Flash Imprint Lithography (S-FIL), and will be used for advanced device research in the areas of novel devices, compound semiconductors, molecular electronics, and photonic and optical devices.
S-FIL technology was developed at the University of Texas in Austin. The technique is based on the ancient craft of embossing, adapted to modern semiconductor needs.
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