Future Challenges.(nanotechnology) : An article from: Nanoparticle News [HTML]

Book Description
This digital document is an article from Nanoparticle News, published by Business Communications Company, Inc. on December 1, 2004. The length of the article is 871 words. The page length shown above is based on a typical 300-word page. The article is delivered in HTML format and is available in your Amazon.com Digital Locker immediately after purchase. You can view it with any web browser.Citation Details
Title: Future Challenges.(nanotechnology)
Publication: Nanoparticle News (Magazine/Journal)
Date: December 1, 2004
Publisher: Business Communications Company, Inc.
Volume: 7 Issue: 11 Page: NADistributed by Thompson Gale

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Lithography. Photolithography is used to transfer an image from a photomask onto a silicon wafer using an optical projection system that exposes a photoresist on the wafer. The photoresist is then chemically developed, similar to a photographic process and then thermally cured so the materials under it can be protected during processing, such as etching. After processing, the photoresist is removed and further processing is performed. One of the key challenges in photolithography is the control and reproducibility of feature size and shape.Photoresist consists of a polymer with a number of chemicals to absorb the light and change the properties of the exposed material. Recent experiments have shown that nanodomains, regions of higher and lower density that form in...


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