X-Ray Diffuse Scattering from Self-Organized Mesoscopic Semiconductor Structures

Book Description
This monograph represents a critical survey about the outstanding capabilities of X-ray diffuse scattering for the structural characterization of mesoscopic materials systems. The mesoscopic regime comprises length scales ranging from a few up to some hundreds of nanometers and is of particular relevance at semiconductor layer systems where e.g. interface roughness or low-dimensional objects such as quantum dots and quantum wires have attracted much interest. An extensive overview of the present state-of-the-art theory of X-ray diffuse scattering at mesocopic structures is given followed by a valuable description of various experimental techniques. Selected up-to-date examples are discussed. The aim of the present book is to combine both aspects of self-organized growth of mesoscopic structures and respective X-ray diffuse scattering experiments.


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This monograph represents a critical survey about the outstanding capabilities of X-ray diffuse scattering for the structural characterization of mesoscopic materials systems. The mesoscopic regime comprises length scales ranging from a few up to some hundreds of nanometers and is of particular relevance at semiconductor layer systems where e.g. interface roughness or low-dimensional objects such as quantum dots and quantum wires have attracted much interest. An extensive overview of the present state-of-the-art theory of X-ray diffuse scattering at mesocopic structures is given followed by a valuable description of various experimental techniques. Selected up-to-date examples are discussed. The aim of the present book is to combine both aspects of self-organized growth of mesoscopic structures and respective X-ray diffuse scattering experiments.


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