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Introduction to Microlithography (Acs Professional Reference Book)

AUTHOR: Larry F. Thompson, et al
ISBN: 0841228485

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         Editorial Review

Introduction to Microlithography (Acs Professional Reference Book)
- Book Review,
by Larry F. Thompson, et al


From Book News, Inc.
Reviews the theory, materials, and processes used in the lithographic process by which circuit elements are fabricated (it is these elements' decreasing size that has made possible the miniaturization of electronic devices). After a brief historical introduction, four major topics are discussed: the physics of the lithographic process, organic resist materials, resist processing, and plasma etching. The new edition reflects the many changes that have occurred since the 1983 publication of this tutorial/reference. Annotation copyright Book News, Inc. Portland, Or.


Book Description
Updated and expanded! Reviews the theory, materials, and processes that are used in the lithographic process. Opens with a brief historical introduction to the advances in microlithography. Discusses four major topics: the physics of the lithographic process, organic resist materials, resist processing, and plasma etching. Designed as a tutorial for researchers with no experience in the field, as well as those experienced in microlithography. Will also prove invaluable to those already involved in microlithography. Includes numerous references for more detailed reading on specific aspects of microlithography.


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         Book Review

Introduction to Microlithography (Acs Professional Reference Book)
- Book Reviews,
by Larry F. Thompson, et al

Introduction to Microlithography

FROM THE CRITICS

Booknews

Reviews the theory, materials, and processes used in the lithographic process by which circuit elements are fabricated (it is these elements' decreasing size that has made possible the miniaturization of electronic devices). After a brief historical introduction, four major topics are discussed: the physics of the lithographic process, organic resist materials, resist processing, and plasma etching. The new edition reflects the many changes that have occurred since the 1983 publication of this tutorial/reference. Annotation c. Book News, Inc., Portland, OR (booknews.com)


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