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Handbook of Microlithography, Micromachining, and Microfabrication. Volume 1: Microlithography (SPIE PRESS Monograph Vol. PM39)

AUTHOR: P. Rai-Choudhury (Editor)
ISBN: 0819423785

SHORT DESCRIPTION: The dynamic field of lithography demands an authoritative handbook for process development and production and to aid in the training of scientists and engineers. It contains process details, recipes, tables, charts, etc., and is useful as a...

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         Editorial Review

Handbook of Microlithography, Micromachining, and Microfabrication. Volume 1: Microlithography (SPIE PRESS Monograph Vol. PM39)
- Book Review,
by P. Rai-Choudhury (Editor)


Book News, Inc.
This first of two volumes covers microlithography, focusing on applications of microlithography techniques in microelectronics manufacturing. Coverage includes optical lithography, electron beam lithography, deep-UV resist technology, X-ray lithography, photomask fabrication procedures and limitations, metrology methods in photolithography, optical lithography modeling, and issues in nanolithography for quantum effect device manufacture. Includes b&w diagrams, charts, and graphs. For researchers and engineers. -- Copyright © 1999 Book News, Inc., Portland, OR All rights reserved


Book Description
Copublished with IEE. The dynamic field of lithography demands an authoritative handbook for process development and production and to aid in the training of scientists and engineers. It contains process details, recipes, tables, charts, etc., and is useful as a reference book or as a textbook.


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         Book Review

Handbook of Microlithography, Micromachining, and Microfabrication. Volume 1: Microlithography (SPIE PRESS Monograph Vol. PM39)
- Book Reviews,
by P. Rai-Choudhury (Editor)

Handbook of Microlithography, Micromachining, and Microfabrication: Volume 1 Microlithography (IEE Materials and Devices Series 12), Vol. 1

FROM THE CRITICS

Booknews

This first of two volumes covers microlithography, focusing on applications of microlithography techniques in microelectronics manufacturing. Coverage includes optical lithography, electron beam lithography, deep-UV resist technology, X-ray lithography, photomask fabrication procedures and limitations, metrology methods in photolithography, optical lithography modeling, and issues in nanolithography for quantum effect device manufacture. Includes b&w diagrams, charts, and graphs. For researchers and engineers. Annotation c. by Book News, Inc., Portland, Or.


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