Handbook of Thin Films, Five-Volume Set ANNOTATION
Audience: Researchers dealing with electronic materials, fabrication, and characterization.
FROM THE PUBLISHER
Thin film materials are the key elements of continued technological advances made in the fields of electronic, optic, and magnetic devices. The processing of materials into thin-films allow easy integration into various types of devices. The materials discussed in this Handbook of Thin Film Materials include semiconductors, superconductors, ferroelectrics, nanostructured materials, magnetic materials among others. Thin film materials have already been used in semiconductor devices, wireless communication, telecommunications, integrated circuits, solar cells, light-emitting diodes, liquid crystal displays, magneto-optic memories, audio and video systems, compact discs, electro-optic coatings, memories, multilayer capacitors, flat-panel displays, smart windows, computer chips, magneto-optic disks, lithography, micro-optical devices, microelectromechanical systems (MEMS) and multifunctional protective coatings, as well as other emerging cutting edge technologies. The vast variety of thin film materials, their deposition, processing and fabrication techniques, spectroscopic characterization and properties compiled in this handbook are the key components of such devices and basis of thin film technology.
Many of these thin film applications have been covered in the five volumes of the Handbook of Thin Film Devices edited by M. H. Francombe (Academic Press, 2000). This reference, Handbook of Thin Film Materials is complementary to this handbook on devices. The publication of these two handbooks, selectively focused on thin film materials and devices, covers almost every conceivable topic on thin films in the fields of science and engineering.
Thin film materials has been one of the most important areas of research in past decades and will continue to be the key research area as well in the new millennium for future generation of electronic, photonic and magnetic technologies. This 5 volume set provides a unique source of in-depth knowledge of deposition, processing, spectroscopy and physical properties of thin film materials.
SYNOPSIS
Thin films—vast in their variety and applications, and key to advances in the technology of electronic, photonic, and magnetic devices—are central to work involving materials science, solid- state physics, electrical and electronics engineering, spectroscopy, superconductivity, optical engineering, device engineering nanotechnology, and information technology. This five-volume reference summarizes advances of the last five decades and complements the Handbook of Thin Film Devices edited by M.H. Francombe (Academic Press, 2000), which covers applications; the two references together cover virtually every conceivable relevant topic. Sixty-five review chapters comprise the five volumes, which are devoted, respectively, to deposition and processing, characterization and spectroscopy, ferroelectric and dielectric, semiconductor and superconductor, and nanomaterials and magnetic thin films. Editor Nalwa is affiliated with Stanford Scientific Corporation and was formerly at Hitachi Research Laboratory in Japan. Book design and production are clear and clean, and the books lie flat when opened; but the bindings are glued instead of sewn, and it's possible that thin film of glue might wear out before the contents are obsolete. Annotation c. Book News, Inc., Portland, OR (booknews.com)
AUTHOR DESCRIPTION
Dr. Hari Singh Nalwa is the Managing Director of the Stanford Scientific Corporation in Los Angeles, California. Previously, he was Head of Department and R&D Manager at the Ciba Specialty Chemicals Corporation in Los Angeles (1999-2000) and a staff scientist at the Hitachi Research Laboratory in Japan (1990-1999). He has authored about 150 scientific articles in leading refereed international journals, books and conference proceedings. He has 18 patents either issued or applied for on electronic and photonic materials and their based devices.
ACCREDITATION
Dr. H. S. Nalwa is the Managing Director of the Stanford Scientific Corporation, Los Angeles, California. He was Head of Department and R&D Manager at the Ciba Specialty Chemicals Corporation in Los Angeles (1999-2000) and a staff scientist at the Hitachi Research Laboratory, Hitachi Ltd., Japan (1990-1999). He has authored more than 150 scientific articles and 18 patents on electronic and photonic materials and devices.
Dr. Nalwa serves on the editorial board of the Journal of Macromolecular Science-Physics, Applied Organometallic Chemistry (1993-1999), International Journal of Photoenergy, and Photonics Science News. He was the founder and Editor-in-Chief of the Journal of Porphyrins and Phthalocyanines published by John Wiley & Sons (1997-2000). Dr. Nalwa is a member of the American Chemical Society (ACS), American Physical Society (APS), Materials Research Society (MRS), Electrochemical Society (ECS), and the American Association for the Advancement of Science (AAAS). Dr. Nalwa has been cited in the Dictionary of International Biography, Who's Who in Science and Engineering, Who's Who in America, and Who's Who in the World.
Dr. H. S. Nalwa is the Managing Director of the Stanford Scientific Corporation, Los Angeles, California. He was Head of Department and R&D Manager at the Ciba Specialty Chemicals Corporation in Los Angeles (1999-2000) and a staff scientist at the Hitachi Research Laboratory, Hitachi Ltd., Japan (1990-1999). He has authored more than 150 scientific articles and 18 patents on electronic and photonic materials and devices.
Dr. Nalwa serves on the editorial board of the Journal of Macromolecular Science-Physics, Applied Organometallic Chemistry (1993-1999), International Journal of Photoenergy, and Photonics Science News. He was the founder and Editor-in-Chief of the Journal of Porphyrins and Phthalocyanines published by John Wiley & Sons (1997-2000). Dr. Nalwa is a member of the American Chemical Society (ACS), American Physical Society (APS), Materials Research Society (MRS), Electrochemical Society (ECS), and the American Association for the Advancement of Science (AAAS). Dr. Nalwa has been cited in the Dictionary of International Biography, Who's Who in Science and Engineering, Who's Who in America, and Who's Who in the World.
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